Bias magnetron sputtering for niobium thin films a. Frigo, G. Lanza,A. Minarello

BIAS MAGNETRON SPUTTERING FOR NIOBIUM THIN FILMS

• A.Frigo, G.Lanza,A.Minarello

• H.Padamsee, V.Palmieri

• Università degli Studi di Padova

• Istituto Nazionale di Fisica Nucleare

• Cornell University

Advantages and disadvanteges of the bias tecnique

• Advantages and disadvanteges of the bias tecnique

• Preliminary results of a mixed bias-magnetron sputtering configuration for coating Niobium on copper 1.5 GHz cavities

• First applications of a large area cavity shaped cathode in the bias diode sputtering configuration.

The positive bias applyed to the grid between target and substrates promotes IONIC BOMBARDMENT OF THE GROWING FILM

• The positive bias applyed to the grid between target and substrates promotes IONIC BOMBARDMENT OF THE GROWING FILM

IONIC BOMBARDMENT OF THE GROWING FILM

• IONIC BOMBARDMENT OF THE GROWING FILM

Impurities re-sputtering

• Impurities re-sputtering

• during the film growth

Impurities are preferentially removed relative to the atoms of the main film.

• Impurities are preferentially removed relative to the atoms of the main film.